Effect of Substrate Temperature on Properties of Copper Oxide Thin Films Coated by Spray Pyrolysis

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Authors

  • Ben Jos
     Optoelectronics and Nanomaterials Research Laboratory, Department of Physics, Union Christian College, Aluva, Kerala, 683102 ,IN
  • K. J. Saji
     International School of Photonics, Cochin University of Science and Technology, Kochi, 682022 ,IN
  • E. I. Anila
     Optoelectronics and Nanomaterials Research Laboratory, Department of Physics, Union Christian College, Aluva, Kerala ,IN

DOI:

https://doi.org/10.18311/jmmf/2023/33351

Keywords:

Spray pyrolysis, surface morphology, bandgap energy, Urbach tailing

Abstract

Copper oxide shows a wide range of optical as well as electrical characteristics depending upon the preparation parameters. This wide range turning capability makes it a preferable candidate for effective use in various application fields like optical filters, light energy harvesting, gas sensing and semiconducting device fabrication. Spray pyrolysis technique with manual spray system was used to deposit a thin layer of copper oxide on glass substrates at temperatures of 300oC, 350oC, and 400oC. X-ray diffraction analysis shows that all the thin films obtained have monoclinic phase. A change of grain size from 15 nm to 25 nm was observedas the substrate temperature was varied from 300oC to 400oC.The Hall coefficient analysis confirms p-type conductivity in films obtained at 300oC and 350oC and N type conductivity with high resistivity for film coated at 400oC. Optical band gap increases from 1.75 to 2.17 eV with the increase in substrate temperature due to energy band tailing.

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Published

2023-04-12

How to Cite

Ben Jos, K. J. Saji, & E. I. Anila. (2023). Effect of Substrate Temperature on Properties of Copper Oxide Thin Films Coated by Spray Pyrolysis. Journal of Mines, Metals and Fuels, 71(1), 24–28. https://doi.org/10.18311/jmmf/2023/33351

Issue

Volume 71, Issue 1, January 2023

Section

Articles

License

Creative Commons License

This work is licensed under a Creative Commons Attribution-NonCommercial 4.0 International License.

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